专利名称：CAPACITOR MANUFACTURING METHOD发明人：Tailu NING,Hironao FUJIKI,Kazuyoshi
YOSHIDA,Michiko SHINGAI
申请号：US13772898申请日：20130221
公开号：US20130177701A1公开日：20130711
专利附图：
摘要：A capacitor manufacturing method that enables a capacitor having a highwithstand voltage, a high electrostatic capacitance and a satisfactorily small ESR to bemanufactured simply and at a high level of productivity. In the capacitor manufacturing
method, a film-formation treatment of applying a conductive polymer solution containinga π-conjugated conductive polymer, a polyanion and a solvent to the dielectric layer sideof a capacitor substrate having a dielectric layer formed on the surface of an anode, andthen performing drying to form a conductive polymer film, is performed at least twice,and the conductive polymer solution used in at least one film-formation treatmentamong the second film-formation treatment and subsequent film-formation treatmentsis a high viscosity solution having a higher viscosity than the conductive polymer solutionused in the first film-formation treatment.
申请人：Tailu NING,Hironao FUJIKI,Kazuyoshi YOSHIDA,Michiko SHINGAI
地址：Saitama-shi JP,Takasaki-shi JP,Kazo-shi JP,Saitama-shi JP
国籍：JP,JP,JP,JP
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