专利名称：Pattern forming method
发明人：Haruki Inabe,Shinichi Kanna,Hiromi Kanda申请号：US11129488申请日：20050516
公开号：US20050255414A1公开日：20051117
摘要：A pattern forming method includes (a) a step of forming a resist film on asubstrate, (b) a pre-wet step of spreading a pre-wet solution on the resist film and after afixed time, removing the pre-wet solution, and (c) a step of subjecting the resist film onthe substrate to exposure through an immersion liquid.
申请人：Haruki Inabe,Shinichi Kanna,Hiromi Kanda
地址：Shizuoka JP,Shizuoka JP,Shizuoka JP
国籍：JP,JP,JP
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