Coatings for microelectronic devices and substrate

专利名称：Coatings for microelectronic devices and

substrates

发明人：Loren A. Haluska申请号：US07/563778申请日：19900807公开号：US05290354A公开日：19940301

摘要：The present invention relates to a method of forming a ceramic or ceramic-likecoating on a substrate, especially electronic devices, as well as the substrate coatedthereby. The method comprises coating said substrate with a solution comprising asolvent, hydrogen silsesquioxane resin and a modifying ceramic oxide precursor selectedfrom the group consisting of tantalum oxide precursors, niobium oxide precursors,vanadium oxide precursors, phosphorous oxide precursors and boron oxide precursors.The solvent is then evaporated to thereby deposit a preceramic coating on the substrate.The preceramic coating is then ceramified by heating the to a temperature of betweenabout 40° C. and about 1000° C. This coating, moreover, may be covered by additionalpassivation and barrier coatings.

申请人：DOW CORNING CORPORATION

代理人：Roger E. Gobrogge

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