专利名称：ARRANGEMENT FOR SPATIALLY LIMITING A
RESERVOIR FOR A MARKER MATERIAL
发明人：Christian Kurz,Sven Gerhard,Andreas
Löffler,Jens Müller
申请号：US15566423申请日：20160414
公开号：US20180102323A1公开日：20180412
专利附图：
摘要：An arrangement includes a confining layer, a metallization layer and asemiconductor component, wherein the metallization layer is arranged on the
semiconductor component, and the confining layer is arranged on the metallization layer,the confining layer spatially establishes a reservoir for the marker material at leastpartially in a defined manner, the confining layer and the metallization layer include anidentical material, and the marker material is arranged in the reservoir of thearrangement.
申请人：OSRAM Opto Semiconductors GmbH
地址：Regensburg DE
国籍：DE
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