专利名称：Exposure apparatus and method发明人：Minori Noguchi,Yukio Kenbo,Yoshitada
Oshida,Masataka Shiba,YasuhiroYoshitaka,Makoto Murayama
申请号：US11117447申请日：20050429
公开号：US20050196713A1公开日：20050908
专利附图：
摘要：A production method of a semiconductor device which includes the steps ofexposing a resist coated on a substrate of a semiconductor device by projecting a first
light pattern on the substrate of the semiconductor device the first light pattern beingformed by passing light through a first mask, and exposing the resist by projecting asecond light pattern on the substrate, the second light pattern being formed by passinglight through a second mask. In the step of exposing the resist by projecting the secondlight pattern, the second light pattern is formed by excimer laser light having an annularshape and passed through the second mask.
申请人：Minori Noguchi,Yukio Kenbo,Yoshitada Oshida,Masataka Shiba,YasuhiroYoshitaka,Makoto Murayama
地址：Yokohama-shi JP,Yokohama-shi JP,Fujisawa-shi JP,Yokohama-shi JP,Yokohama-shi JP,Fujisawa-shi JP
国籍：JP,JP,JP,JP,JP,JP
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