Colloidal silica particles, process for producing

专利名称：Colloidal silica particles, process for

producing the same, and organic solvent-dispersed silica sol, polymerizablecompound-dispersed silica sol, anddicarboxylic anhydride-dispersed silica soleach obtained from the same

发明人：Naohiko Suemura,Keiko Yoshitake,Toshiaki

Takeyama

申请号：US12867289申请日：20090212公开号：US09284197B2公开日：20160315

摘要：There is provided colloidal silica particles comprising at least one polyvalentmetal element M selected from a group consisting of iron, aluminum, zinc, zirconium,titanium, tin, and lead in an average content of 0.001 to 0.02 in terms of an M/Si molarratio, and having an average primary particle diameter of 5 to 40 nm, wherein the contentof the polyvalent metal element M present in an outermost layer of the colloidalparticles is 0 to 0.003 atom per square nanometer (nm) of a surface area of the colloidalparticles; and a silica sol that the colloidal silica particles are dispersed in an organicsolvent, a silica sol that the colloidal silica particles are dispersed in a polymerizablecompound, and a silica sol that the colloidal silica particles are dispersed in a dicarboxylicanhydride.

申请人：Naohiko Suemura,Keiko Yoshitake,Toshiaki Takeyama

地址：Sodegaura JP,Sodegaura JP,Funabashi JP

国籍：JP,JP,JP

代理机构：Oliff PLC

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