专利名称：Organic anti-reflective coating compositions
for advanced microlithography
发明人：Shreeram V. Deshpande申请号：US10062790申请日：20020201
公开号：US20030162125A1公开日：20030828
摘要：New polymers and new anti-reflective compositions containing such polymersare provided. The compositions comprise a polymer (e.g., epoxy cresol novolac resins)bonded with a chromophore (4-hydroxybenzoic acid, trimellitic anhydride). The inventivecompositions can be applied to substrates (e.g., silicon wafers) to form anti-reflectivecoating layers having high etch rates which minimize or prevent reflection duringsubsequent photoresist exposure and developing.
申请人：DESHPANDE SHREERAM V.
更多信息请下载全文后查看
因篇幅问题不能全部显示，请点此查看更多更全内容