专利名称：Method for producing polymer and polymer发明人：阿達 鉄平,提箸 正義,小野 絵実子,小野塚 英之申请号：JP2018207176申请日：20181102公开号：JP2020070399A公开日：20200507
摘要：Problem to be solved: to provide a method of producing a polymer exhibiting aparticularly favorable LWR when the amount of residual monomer is small and applied toa resist composition. Solution Decompose by exposureA repeating unit derived from amonomer (a) containing an acid generating structureA repeating unit derived from amonomer (b) with an acid labileContains repeating units derived from monomers (c)having phenolic hydroxy groups andA method of manufacturing a polymer having aresidual amount of monomer (a) contained in a polymer is 1.0 mass% or lessMonomer(a),A monomer solution containing monomer (b) and monomer (c) isProcess for supplyingreaction potAnd, the step of carrying out a polymerization reaction in the reactionchamber is includedThe monomer concentration in the monomer solution in the reactionchamber is 35 mass% or moreA method of manufacturing a polymer comprising at leastone species selected from the solvent (s) of the monomer solution represented by thefollowing formula (s-1) and formula (S-2). No selection
申请人：信越化学工業株式会社
地址：東京都千代田区大手町二丁目６番１号
国籍：JP
代理人：特許業務法人英明国際特許事務所
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